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Product & Material Catalog
Chemraz® FFKM
Chemraz® 551
Chemraz® 551 is ideally suited as a universal sealing material
Chemraz® FFKM

Chemraz® 551

Semiconductor

With its broad chemical resistance, Chemraz® 551 is ideally suited as a universal sealing material for both aqueous and dry semiconductor wafer processing and chemical/DI water distribution systems. With the lowest outgassing profile for perfluoroelastomer materials in high-temperature applications, Chemraz® 551 provides a cleaner process environment. Because of its reduced surface stiction, it can be used for semi-dynamic and static applications. Chemraz® 551 remains stable at operating temperatures up to 572°F (300°C), while maintaining exceptional compression set.

Features & Benefits
  • Broad chemical compatibility
  • High temperature capability (up to 600°F/316°C)
  • Excellent compression set maintains seal integrity in wide temperature and pressure variations as well as vibration
  • Breadth of capabilities allows for standardization on one material and reduces inventory line items
  • Longer and better seal integrity in seal applications
  • Lower overall equipment cost of operation
  • World class cleanliness in semiconductor and wet applications
Applications
  • Chamber seals
  • Dispensing seals
  • Fitting and union seals
  • Filter seals
  • Gas inlet/outlet seals
  • Gaskets
  • Gate valve seals
  • Isolator valve seals
  • Reaction chamber lid seals
  • Regulator seals
  • Seals in close proximity to high-temperature water heaters
  • Slit valve seals
  • Tube capping seals
  • Valve seals
Configurations
  • Atomic layer deposition
  • Electrochemical plating
  • Epitaxial deposition
  • LPCVD (silicon nitride, silicon oxide)
  • Photolithography track pre-cleaning
  • RTP (annealing, oxidation, nitridation, silicidation)
  • Silicon water ingot growing
  • SOI annealing
  • Typical etch & deposition plasma gases, including NF3 and O2
  • Thermal CVD
  • Wet cleaning (batch and single wafer)
  • Wet etch (oxide, nitride, metal)
  • Wet photo resist strip (acid, solvent)
Temperature Range
–18°C to 324°C (0°F to 615°F)

For applications facing extreme temperatures, high pressures, or uniquely challenging operating conditions, our global engineering team delivers fully custom‑engineered solutions. Because every critical environment is different, these designs are developed in close collaboration with you—let’s discuss your requirements to build the right solution.

Need something more custom?
Add this to your quote and we can discuss your requirements.
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