Chemraz 663

Chemraz® 663, a perfluoroelastomer (FFKM), is engineered to withstand low-temperature Etch and Deposition applications where plasma resistance and the ability to maintain sealing force in a vacuum are critical, such as electrostatic chuck assemblies.

Features & Benefits

Exceptional plasma performance at low temps

Applications

Deposition
Conductor Etch
Dielectric Etch
Electrostatic chuck (ESC)
Low-temperature, vacuum environments

Configurations

Electrostatic chuck (ESC)
Low-temperature
Vacuum environments

Temperature Range

-40°C to 180°C (-40°F to 356°F)

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