Chemraz® G38

Chemraz® G38 is developed for high-density plasma systems where seal reliability and minimal contamination are essential. It provides excellent chemical compatibility and withstands a variety of aggressive chemicals. Available in a range of geometries and cross-sections, Chemraz® G38 offers the diversity required for dynamic or static dry processing applications. Recommended for slit valves and long term service temperatures up to 437°F (225°C).

Features & Benefits

Minimal contamination
Withstands a variety of aggressive chemicals
Excellent physical properties
Low metal ion content
Unlimited design flexibility

Applications

Bonded gate seals
Chamber seals

Resources

Chemraz® G38 Minimal Contamination in Dry Plasma Etching Processes

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